Electrical Characterization of TiO2 Grown By Metalorganic Chemical Vapor Deposition (MOCVD) in Metal-Insulator-Semiconductor (MIS) Structure

Publication Name : Proceedings The Ninth International Conference On Microelectronics 1 (1 …, 1997

Citation :

Date : 1997


Publication URL
https://scholar.google.com/scholar?q=+intitle:"Electrical Characterization of TiO2 Grown By Metalorganic Chemical Vapor Deposition (MOCVD) in Metal-Insulator-Semiconductor (MIS) Structure"