Simulation of charging voltages on a wafer during plasma etch

Publication Name : Proceedings of SPIE - The International Society for Optical Engineering

DOI : 10.1117/12.324389

Date : 1998


Publication URL
https://www.scopus.com/record/display.uri?eid=2-s2.0-0032404843&origin=resultslist&sort=plf-f
Type
Conference Proceedin
ISSN
277786
Volume
3510
Page
229-232